Tungsten‐carbon multilayers for x‐ray optics prepared by ArF excimer‐laser‐induced chemical vapor deposition
作者:
Katsuhiko Mutoh,
Yuka Yamada,
Takashi Iwabuchi,
Takeo Miyata,
期刊:
Journal of Applied Physics
(AIP Available online 1990)
卷期:
Volume 68,
issue 3
页码: 1361-1363
ISSN:0021-8979
年代: 1990
DOI:10.1063/1.346684
出版商: AIP
数据来源: AIP
摘要:
The authors have studied the characteristics of tungsten (W) and carbon (C) thin films, and W/C multilayers prepared by ArF excimer‐laser‐induced chemical vapor deposition using tungsten hexafluoride and benzene gases. Amorphous W and C films with very smooth surfaces were obtained at substrate temperatures of 100–200 °C and 100–300 °C, respectively. In small‐angle x‐ray scattering measurements for the multilayers deposited at 200 °C, a first order of multilayer reflections were clearly observed. Furthermore, Auger electron spectroscopy showed that W and C layers in the multilayers were periodically deposited.
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