A technique for replicating x‐ray masks with no magnification of the master mask pattern has been developed. This technique uses a raster scanning pattern with a synchrotron x‐ray source to eliminate pattern magnification due to the source divergence. Kinematic mounts were employed to reduce clamping induced distortions in the mask replication process and the metrology tool. Finite element analysis of the thermal response of the clamped master and replicate masks during exposure indicates the temperature increase of the two membranes during exposure is matched, so that thermal distortions are not transferred to the printed pattern.