Modification of band offsets by a ZnSe intralayer at the Si/Ge(111) interface
作者:
M. Pan,
S. P. Wilks,
P. R. Dunstan,
M. Pritchard,
R. H. Williams,
D. S. Cammack,
S. A. Clark,
期刊:
Applied Physics Letters
(AIP Available online 1998)
卷期:
Volume 72,
issue 21
页码: 2707-2709
ISSN:0003-6951
年代: 1998
DOI:10.1063/1.121106
出版商: AIP
数据来源: AIP
摘要:
In this letter, the use of an ordered ultrathin ZnSe dipole layer to significantly modify the band discontinuity at the Si/Ge(111)-c(2×8)heterojunction is reported. Soft x-ray photoemission spectroscopy (SXPS) was utilized to monitor the evolution of the interface. The ZnSe intralayer increased the valence band offset by ∼0.57 eV, as compared to a negligible valence band offset for the Si/Ge(111) junction. This dramatic modification is interpreted in terms of the charge transfer at the interface. ©1998 American Institute of Physics.
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