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Modification of band offsets by a ZnSe intralayer at the Si/Ge(111) interface

 

作者: M. Pan,   S. P. Wilks,   P. R. Dunstan,   M. Pritchard,   R. H. Williams,   D. S. Cammack,   S. A. Clark,  

 

期刊: Applied Physics Letters  (AIP Available online 1998)
卷期: Volume 72, issue 21  

页码: 2707-2709

 

ISSN:0003-6951

 

年代: 1998

 

DOI:10.1063/1.121106

 

出版商: AIP

 

数据来源: AIP

 

摘要:

In this letter, the use of an ordered ultrathin ZnSe dipole layer to significantly modify the band discontinuity at the Si/Ge(111)-c(2×8)heterojunction is reported. Soft x-ray photoemission spectroscopy (SXPS) was utilized to monitor the evolution of the interface. The ZnSe intralayer increased the valence band offset by ∼0.57 eV, as compared to a negligible valence band offset for the Si/Ge(111) junction. This dramatic modification is interpreted in terms of the charge transfer at the interface. ©1998 American Institute of Physics.

 

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