首页   按字顺浏览 期刊浏览 卷期浏览 Direct engraving on positive resists by synchrotron radiation
Direct engraving on positive resists by synchrotron radiation

 

作者: S. Ichimura,   M. Hirata,   H. Tanino,   N. Atoda,   M. Ono,   K. Hoh,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  （AIP Available online 1983）
卷期: Volume 1, issue 4  

页码: 1076-1079

 

ISSN:0734-211X

 

年代: 1983

 

DOI:10.1116/1.582636

 

出版商: American Vacuum Society

 

关键词: masking;synchrotron radiation;etching;electron spectroscopy;mass spectroscopy;silicon nitrides;lithography;surface structure;photoresists;sensitivity;decomposition

 

数据来源: AIP

 

摘要:

Direct engraving of mask patterns in a resist film was tried by exposing with synchrotron radiation. Using a stencil mask made of a Si3N4substrate, submicron structures could be successfully replicated. Fundamental aspects of resist decomposition by synchrotron radiation were also investigated by mass and electron spectroscopy.

 

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