Effect of rapid thermal annealing on carrier lifetimes of arsenic‐ion‐implanted GaAs
作者:
Gong‐Ru Lin,
Wen‐Chung Chen,
Feruz Ganikhanov,
C.‐S. Chang,
Ci‐Ling Pan,
期刊:
Applied Physics Letters
(AIP Available online 1996)
卷期:
Volume 69,
issue 7
页码: 996-998
ISSN:0003-6951
年代: 1996
DOI:10.1063/1.117107
出版商: AIP
数据来源: AIP
摘要:
Femtosecond time‐resolved reflectivity measurements, structural, and electrical analyses have been performed to investigate the effect of rapid thermal annealing (RTA) on GaAs implanted with 200 keV arsenic ions at 1016ions/cm2. Ultrashort carrier lifetimes from 0.48 fs to 2.3 ps were observed for samples annealed at temperatures between 600 and 800 °C. The time constants are somewhat shorter than those of RTA‐annealed low‐temperature molecular‐beam epitaxy grown material, while following the same trend of longer time constants and recovery of resistance at higher annealing temperatures. Arsenic precipitates were not observed. ©1996 American Institute of Physics.
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