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The structural homogeneity of boron carbide thin films fabricated using plasma‐enhanced chemical vapor deposition from B5H9+CH4

 

作者: Sunwoo Lee,   J. Mazurowski,   W. L. O’Brien,   Q. Y. Dong,   J. J. Jia,   T. A. Callcott,   Yexin Tan,   K. E. Miyano,   D. L. Ederer,   D. R. Mueller,   P. A. Dowben,  

 

期刊: Journal of Applied Physics  （AIP Available online 1993）
卷期: Volume 74, issue 11  

页码: 6919-6924

 

ISSN:0021-8979

 

年代: 1993

 

DOI:10.1063/1.355066

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Boron carbide thin films of several B/C ratios have been deposited on Si(111) using plasma‐enhanced chemical vapor deposition fromnido‐pentaborane(9) (B5H9) and methane (CH4). X‐ray diffraction studies of boron carbide thin films on Si(111) exhibited characteristic microcrystalline diffraction lines. Soft x‐ray emission spectroscopy was used to verify that the local electronic structure and composition of each sample corresponded to a homogeneous solid solution boron carbide phase.  

 

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