Nanostructure array fabrication with a size-controllable natural lithography
作者:
Chiseki Haginoya,
Masayoshi Ishibashi,
Kazuyuki Koike,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 71,
issue 20
页码: 2934-2936
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.120220
出版商: AIP
数据来源: AIP
摘要:
A simple technique for size-controllable nanostructure array formation has been developed, using self-assembled polystyrene beads whose diameters can be arbitrarily reduced by reactive ion etching. We have produced a hole array of 83 and 157 nm diameter with 200 nm pitch on Si substrate. This technique can find potential applications in many areas of science and technology. ©1997 American Institute of Physics.
点击下载:
PDF
(275KB)
返 回