Highly sensitive analytical method for metallic impurities in the thin silicon layer of silicon-on-insulator wafer
作者:
J. Kodate,
K. Machida,
K. Imai,
M. Tanaka,
N. Yabumoto,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1997)
卷期:
Volume 15,
issue 1
页码: 171-173
ISSN:1071-1023
年代: 1997
DOI:10.1116/1.589244
出版商: American Vacuum Society
关键词: Si
数据来源: AIP
摘要:
A new analytical method for thin Si layer is proposed that uses low temperature oxidation and chemical analysis. The thin Si layer of silicon-on-insulator wafers is oxidized at a low temperature by electron cyclotron resonance oxygen plasma. The oxide is analyzed by vapor phase decomposition method and atomic absorption spectrometry. This approach makes it possible to analyze metallic impurities without the diffusion of contaminants because the oxidation is carried out at a low temperature. The results reveal that metallic impurity concentrations below 1010atoms/cm2can be detected with a depth resolution of 4 nm.
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