Growth rate and quality variation of homoepitaxial diamond grown at elevated temperatures
作者:
R. A. Weimer,
T. P. Thorpe,
K. A. Snail,
期刊:
Journal of Applied Physics
(AIP Available online 1995)
卷期:
Volume 77,
issue 2
页码: 641-645
ISSN:0021-8979
年代: 1995
DOI:10.1063/1.359518
出版商: AIP
数据来源: AIP
摘要:
Homoepitaxial diamond films were grown at temperatures between 1000 and 1400 °C with an oxy‐acetylene torch. The growth rates of the {100} and {111} faces were observed to increase through 1400 °C, while the {110} face did not grow above 1400 °C. The quality of all faces deteriorated significantly between 1300 and 1400 °C, as shown by scanning electron microscopy and Raman spectroscopy. The transparency of a film as measured by Fourier‐transform infrared spectroscopy was type‐IIa quality with very little C–H absorption.
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