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Growth rate and quality variation of homoepitaxial diamond grown at elevated temperatures

 

作者: R. A. Weimer,   T. P. Thorpe,   K. A. Snail,  

 

期刊: Journal of Applied Physics  (AIP Available online 1995)
卷期: Volume 77, issue 2  

页码: 641-645

 

ISSN:0021-8979

 

年代: 1995

 

DOI:10.1063/1.359518

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Homoepitaxial diamond films were grown at temperatures between 1000 and 1400 °C with an oxy‐acetylene torch. The growth rates of the {100} and {111} faces were observed to increase through 1400 °C, while the {110} face did not grow above 1400 °C. The quality of all faces deteriorated significantly between 1300 and 1400 °C, as shown by scanning electron microscopy and Raman spectroscopy. The transparency of a film as measured by Fourier‐transform infrared spectroscopy was type‐IIa quality with very little C–H absorption.

 

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