首页   按字顺浏览 期刊浏览 卷期浏览 Electron and hole drift mobility in amorphous silicon
Electron and hole drift mobility in amorphous silicon

 

作者: A. R. Moore,  

 

期刊: Applied Physics Letters  (AIP Available online 1977)
卷期: Volume 31, issue 11  

页码: 762-764

 

ISSN:0003-6951

 

年代: 1977

 

DOI:10.1063/1.89539

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Electron and hole drift mobility have been measured inn‐ andp‐type amorphous Si Schottky‐barrier solar cells. At room temperature &mgr;dn= (2–5) ×10−2cm2/V sec and &mgr;dp= (5–6) ×10−4cm2/V sec. Both mobilities are trap controlled with &Dgr;E=0.19 eV for electrons and &Dgr;E=0.35 eV for holes above 250 °K and &Dgr;E=0.16 and 0.26 eV, respectively, below 250 °K. Majority‐carrier lifetimes are estimated to be 1 &mgr;sec for electrons and 25 &mgr;sec for holes.

 

点击下载:  PDF (224KB)



返 回