Deep sulfur‐related centers in silicon
作者:
H. G. Grimmeiss,
E. Janze´n,
B. Skarstam,
期刊:
Journal of Applied Physics
(AIP Available online 1980)
卷期:
Volume 51,
issue 8
页码: 4212-4217
ISSN:0021-8979
年代: 1980
DOI:10.1063/1.328279
出版商: AIP
数据来源: AIP
摘要:
The electronic properties of two dominant sulfur‐related deep donor levels in silicon have been investigated using capacitance and dark current transient techniques. One of the centers, theBcenter, has an enthalpy &Dgr;Hnof 0.32 eV and an electron‐capture cross section &sgr;tnBof 2×10−15cm2at 100 K. &sgr;tnBvaries with temperature asT−3.3. A plot of log etnAvs 1/Tfor the other center, theAcenter, shows a ’’thermal activation energy’’ of 0.59 eV. &sgr;tnAis estimated to be larger than 10−14cm2. The nature of theAandBcenters is discussed.
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