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Deep sulfur‐related centers in silicon

 

作者: H. G. Grimmeiss,   E. Janze´n,   B. Skarstam,  

 

期刊: Journal of Applied Physics  (AIP Available online 1980)
卷期: Volume 51, issue 8  

页码: 4212-4217

 

ISSN:0021-8979

 

年代: 1980

 

DOI:10.1063/1.328279

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The electronic properties of two dominant sulfur‐related deep donor levels in silicon have been investigated using capacitance and dark current transient techniques. One of the centers, theBcenter, has an enthalpy &Dgr;Hnof 0.32 eV and an electron‐capture cross section &sgr;tnBof 2×10−15cm2at 100 K. &sgr;tnBvaries with temperature asT−3.3. A plot of log etnAvs 1/Tfor the other center, theAcenter, shows a ’’thermal activation energy’’ of 0.59 eV. &sgr;tnAis estimated to be larger than 10−14cm2. The nature of theAandBcenters is discussed.

 

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