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Voltage shifts and imprint in ferroelectric capacitors

 

作者: W. L. Warren,   D. Dimos,   G. E. Pike,   B. A. Tuttle,   M. V. Raymond,   R. Ramesh,   J. T. Evans,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 67, issue 6  

页码: 866-868

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.115531

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Voltage offsets in the polarization‐voltage characteristics of Pb(Zr,Ti)O3capacitors can be induced by either thermal or optical processes. The thermally (optically) induced voltage shift occurs by heating (illuminating) the sample under remanence or a saturating bias. Generally speaking, the thermally induced voltage shifts are greater than those obtained optically; this is attributed to the role of oxygen vacancy‐related defect dipoles throughout the film. We find that the inclusion of a dopant element that occupies a portion of the Ti(Zr) sites and has an oxidation state greater than +4 reduces the thermally induced voltage shifts observed in the capacitors. This may result because these particular dopants reduce the oxygen vacancy density and, hence, the defect‐dipole contribution to the voltage shift. ©1995 American Institute of Physics.

 

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