Calibrated mapping of the electrical activity in deformed silicon by means of charge‐collection microscopy
作者:
L. W. Snyman,
H. C. Snyman,
J. A. A. Engelbrecht,
期刊:
Journal of Applied Physics
(AIP Available online 1986)
卷期:
Volume 59,
issue 4
页码: 1216-1219
ISSN:0021-8979
年代: 1986
DOI:10.1063/1.336508
出版商: AIP
数据来源: AIP
摘要:
A method has been developed to obtain, by means of charge‐collection microscopy (CCM), a calibrated two‐dimensional map of the electrical activity of the minority carriers in a semiconductor crystal over large crystal dimensions. This is achieved by the calibration of the collection current in terms of the minority‐carrier diffusion length and a photographic gray scale. The technique is applied to plastically deformed silicon and proves that it has great potential for the evaluation of electrical activity mechanisms in imperfect silicon.
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