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Calibrated mapping of the electrical activity in deformed silicon by means of charge‐collection microscopy

 

作者: L. W. Snyman,   H. C. Snyman,   J. A. A. Engelbrecht,  

 

期刊: Journal of Applied Physics  (AIP Available online 1986)
卷期: Volume 59, issue 4  

页码: 1216-1219

 

ISSN:0021-8979

 

年代: 1986

 

DOI:10.1063/1.336508

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A method has been developed to obtain, by means of charge‐collection microscopy (CCM), a calibrated two‐dimensional map of the electrical activity of the minority carriers in a semiconductor crystal over large crystal dimensions. This is achieved by the calibration of the collection current in terms of the minority‐carrier diffusion length and a photographic gray scale. The technique is applied to plastically deformed silicon and proves that it has great potential for the evaluation of electrical activity mechanisms in imperfect silicon.

 

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