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Static compression of silicon in the [100] and in the [111] directions

 

作者: Mool C. Gupta,   Arthur L. Ruoff,  

 

期刊: Journal of Applied Physics  (AIP Available online 1980)
卷期: Volume 51, issue 2  

页码: 1072-1075

 

ISSN:0021-8979

 

年代: 1980

 

DOI:10.1063/1.327714

 

出版商: AIP

 

数据来源: AIP

 

摘要:

High pressures were generated using a diamond indentor technique. The phase transition in silicon loaded in the [100] direction and silicon loaded in the [111] direction under high pressure was studied. From the behavior of electrical resistance of silicon loaded in the [100] direction, it was found that it becomes metallic at about 12.0 GPa in agreement with the previously reported results on silicon using different techniques. However, silicon loaded in the [111] direction becomes metallic at a lower pressure. The silicon transition is highly sensitive to the type of stress applied.

 

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