Characteristics of diazonaphthoquinone‐4‐ and ‐5‐sulfonate derivatives as sensitizers for electron‐beam positive resists

 

作者: Katsumi Tanigaki,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  （AIP Available online 1988）
卷期: Volume 6, issue 1  

页码: 91-94

 

ISSN:0734-211X

 

年代: 1988

 

DOI:10.1116/1.584059

 

出版商: American Vacuum Society

 

关键词: POLYMERS;ELECTRON BEAMS;LITHOGRAPHY;SENSITIVITY;ELECTRON COLLISIONS;PHOTORESISTS;MAN;RESISTS

 

数据来源: AIP

 

 

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