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Comment on ’’Capacitance‐voltage measurements in amorphous Schottky barriers’’

 

作者: M. J. Powell,   G. H. Do¨hler,  

 

期刊: Journal of Applied Physics  (AIP Available online 1981)
卷期: Volume 52, issue 1  

页码: 517-518

 

ISSN:0021-8979

 

年代: 1981

 

DOI:10.1063/1.328447

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The band‐bending potential profileV(x) in the space‐charge region of an amorphous semiconductor moves regidly in thexdirection, with increased bias, irrespective of the form of the density of localized statesN(E). A recent paper by Singh and Cohen [J. Appl. Phys. 51, 413 (1980)] which suggest this is not true is incorrect in this point. This property leads to simplified schemes for the analysis ofC‐Vmeasurements and field‐effect conductance measurements.

 

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