Comment on ’’Capacitance‐voltage measurements in amorphous Schottky barriers’’
作者:
M. J. Powell,
G. H. Do¨hler,
期刊:
Journal of Applied Physics
(AIP Available online 1981)
卷期:
Volume 52,
issue 1
页码: 517-518
ISSN:0021-8979
年代: 1981
DOI:10.1063/1.328447
出版商: AIP
数据来源: AIP
摘要:
The band‐bending potential profileV(x) in the space‐charge region of an amorphous semiconductor moves regidly in thexdirection, with increased bias, irrespective of the form of the density of localized statesN(E). A recent paper by Singh and Cohen [J. Appl. Phys. 51, 413 (1980)] which suggest this is not true is incorrect in this point. This property leads to simplified schemes for the analysis ofC‐Vmeasurements and field‐effect conductance measurements.
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