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Chemiluminescent reaction of SiF2with fluorine and the etching of silicon by atomic and molecular fluorine

 

作者: John A. Mucha,   Daniel L. Flamm,   Vincent M. Donnelly,  

 

期刊: Journal of Applied Physics  (AIP Available online 1982)
卷期: Volume 53, issue 6  

页码: 4553-4554

 

ISSN:0021-8979

 

年代: 1982

 

DOI:10.1063/1.331204

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The homogeneous reaction between F or F2and SiF2, the latter formed by the high‐temperature reaction of solid silicon with SiF4, is accompanied by an intense chemiluminescent ’’flame’’ with the spectrum previously observed during silicon etching by F and F2. This experiment provides direct confirmatory evidence that chemiluminescence from both reactions arises from the homogeneous reaction between SiF2and fluorine atoms or molecules.

 

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