Chemiluminescent reaction of SiF2with fluorine and the etching of silicon by atomic and molecular fluorine
作者:
John A. Mucha,
Daniel L. Flamm,
Vincent M. Donnelly,
期刊:
Journal of Applied Physics
(AIP Available online 1982)
卷期:
Volume 53,
issue 6
页码: 4553-4554
ISSN:0021-8979
年代: 1982
DOI:10.1063/1.331204
出版商: AIP
数据来源: AIP
摘要:
The homogeneous reaction between F or F2and SiF2, the latter formed by the high‐temperature reaction of solid silicon with SiF4, is accompanied by an intense chemiluminescent ’’flame’’ with the spectrum previously observed during silicon etching by F and F2. This experiment provides direct confirmatory evidence that chemiluminescence from both reactions arises from the homogeneous reaction between SiF2and fluorine atoms or molecules.
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