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X‐ray induced mask contamination and particulate monitoring in x‐ray steppers

 

作者: C. Capasso,   A. Pomerene,   W. Chu,   J. Leavey,   A. Lamberti,   S. Hector,   J. Oberschmidt,   V. Pol,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  （AIP Available online 1996）
卷期: Volume 14, issue 6  

页码: 4336-4340

 

ISSN:1071-1023

 

年代: 1996

 

DOI:10.1116/1.589048

 

出版商: American Vacuum Society

 

关键词: Si:B

 

数据来源: AIP

 

摘要:

The belief that proximity x‐ray lithography is insensitive to contamination has been based on the assumption that contaminants are small hydrocarbon compounds. However, we will show that x rays may induce photoassisted processes that deposit saltlike films on the mask surface. We will also provide an explanation for the film geometry in the early stages of its growth and suggest some possible solutions to the issue.

 

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