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Photoelectric Yields in the Vacuum Ultraviolet

 

作者: W. C. Walker,   N. Wainfan,   G. L. Weissler,  

 

期刊: Journal of Applied Physics  (AIP Available online 1955)
卷期: Volume 26, issue 11  

页码: 1366-1371

 

ISSN:0021-8979

 

年代: 1955

 

DOI:10.1063/1.1721909

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Absolute photoelectric yields of Ni, Cu, Pt, Au, W, Mo, Ag, and Pd are presented for the spectral region from 1400 to 473 A. Measurements were obtained for commercially pure polycrystalline surfaces which were treated in various ways including heat treatmentin vacuoand in various gas atmospheres at reduced pressures. Surfaces, heat treatedin vacuo, gave reproducible yields ranging from 10−3electrons per photon at 1400 A to 10−1electrons per photon at 500 A. Although untreated samples exhibited a maximum in the region studied, this maximum disappeared after heat treatment resulting in most cases in a broad plateau extending from 1000 A to 500 A. At wavelengths longer than 1000 A a decrease in yield was observed. Representative experiments with a Ni cathode, heat treatedin vacuothen exposed to O2at reduced pressures, indicated that the maxima for untreated surfaces were caused by adsorbed gases and metallic oxide formation. The absolute error in the values of the photoyields was estimated to be within ±15%.

 

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