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Magnetic anisotropy of direct‐current magnetron sputtered CoCr films

 

作者: Z.‐M. Li,   R. R. Parsons,  

 

期刊: Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films  （AIP Available online 1988）
卷期: Volume 6, issue 6  

页码: 3062-3067

 

ISSN:0734-2101

 

年代: 1988

 

DOI:10.1116/1.575475

 

出版商: American Vacuum Society

 

关键词: DIFFUSION;MAGNETIC ANISOTROPY;THIN FILMS;SPUTTERING;COBALT ALLOYS;CHROMIUM ALLOYS;ADSORPTION;CRYSTAL ORIENTATION

 

数据来源: AIP

 

摘要:

The magnetic anisotropy constant of dc magnetron sputtered CoCr films are investigated as a function of the sputtering power and the target‐to‐substrate distance. The results can be interpreted in terms of the dependence of adatom diffusion on the supttering parameters. The orientation of the easy (hard) axis of the uniaxial magnetic anisotropy is found to be tilted away from the film normal and varies with the orientation of the substrate with respect to the target.

 

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