Liquid source misted chemical deposition (LSMCD)–a critical review
作者:
Maria Huffman,
期刊:
Integrated Ferroelectrics
(Taylor Available online 1995)
卷期:
Volume 10,
issue 1-4
页码: 39-53
ISSN:1058-4587
年代: 1995
DOI:10.1080/10584589508012262
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
The aim of this paper is to describe a relatively new thin film deposition technique called Liquid Source Misted Chemical Deposition (LSMCD) that has been successfully utilized to synthesize a variety of multicomponent oxide materials. This report provides an understanding of the basic principles of operation and the suitability, performance, capabilities and drawbacks for production applications using LSMCD.
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