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Radiation blistering of polycrystalline niobium by helium‐ion implantation

 

作者: S. K. Das,   M. Kaminsky,  

 

期刊: Journal of Applied Physics  (AIP Available online 1973)
卷期: Volume 44, issue 1  

页码: 25-31

 

ISSN:0021-8979

 

年代: 1973

 

DOI:10.1063/1.1661870

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The radiation blistering of polycrystalline niobium surfaces at room temperature has been investigated for different doses of helium ions implanted at 0.5 MeV and for different amounts of initial defect structure in the samples. The cold‐worked samples show large blisters (up to 500 &mgr;m in diameter), many of which are ruptured. In samples annealed before irradiation, the blistering at low doses (0.1 C/cm2) was lower than in the cold‐worked sample, but at a higher dose (1.0 C/cm2) the blistering was even greater. The observation of interconnecting bubbles offers a possible explanation for the formation of such large blisters at low temperatures.

 

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