Radiation blistering of polycrystalline niobium by helium‐ion implantation
作者:
S. K. Das,
M. Kaminsky,
期刊:
Journal of Applied Physics
(AIP Available online 1973)
卷期:
Volume 44,
issue 1
页码: 25-31
ISSN:0021-8979
年代: 1973
DOI:10.1063/1.1661870
出版商: AIP
数据来源: AIP
摘要:
The radiation blistering of polycrystalline niobium surfaces at room temperature has been investigated for different doses of helium ions implanted at 0.5 MeV and for different amounts of initial defect structure in the samples. The cold‐worked samples show large blisters (up to 500 &mgr;m in diameter), many of which are ruptured. In samples annealed before irradiation, the blistering at low doses (0.1 C/cm2) was lower than in the cold‐worked sample, but at a higher dose (1.0 C/cm2) the blistering was even greater. The observation of interconnecting bubbles offers a possible explanation for the formation of such large blisters at low temperatures.
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