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X‐Ray Diffraction Study of Argon Crystal Growth

 

作者: O. G. Peterson,   D. N. Batchelder,   R. O. Simmons,  

 

期刊: Journal of Applied Physics  (AIP Available online 1965)
卷期: Volume 36, issue 9  

页码: 2682-2685

 

ISSN:0021-8979

 

年代: 1965

 

DOI:10.1063/1.1714560

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Diffraction studies were carried out near 4°K on the influence of rate and method of growth upon the perfection and microstructure of 99.998% purity argon crystals. The crystallography of the twinning observed was directly verified to be of the type expected for a fcc crystal. Some idea of the dislocation content of a well‐annealed argon crystal was obtained. It was concluded that it should be possible to produce crystals having a perfection adequate for a variety of quantitative lattice studies.

 

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