X‐Ray Diffraction Study of Argon Crystal Growth
作者:
O. G. Peterson,
D. N. Batchelder,
R. O. Simmons,
期刊:
Journal of Applied Physics
(AIP Available online 1965)
卷期:
Volume 36,
issue 9
页码: 2682-2685
ISSN:0021-8979
年代: 1965
DOI:10.1063/1.1714560
出版商: AIP
数据来源: AIP
摘要:
Diffraction studies were carried out near 4°K on the influence of rate and method of growth upon the perfection and microstructure of 99.998% purity argon crystals. The crystallography of the twinning observed was directly verified to be of the type expected for a fcc crystal. Some idea of the dislocation content of a well‐annealed argon crystal was obtained. It was concluded that it should be possible to produce crystals having a perfection adequate for a variety of quantitative lattice studies.
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