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Low‐temperature annealing of ion‐implanted KNbO3waveguides for second‐harmonic generation

 

作者: Tomas Pliska,   Dieter H. Jundt,   Daniel Fluck,   Peter Gu¨nter,   Daniel Rytz,   Martin Fleuster,   Christoph Buchal,  

 

期刊: Journal of Applied Physics  (AIP Available online 1995)
卷期: Volume 77, issue 12  

页码: 6114-6120

 

ISSN:0021-8979

 

年代: 1995

 

DOI:10.1063/1.359137

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Results on annealing experiments of He+ion‐implanted KNbO3planar and channel waveguides are reported. Annealing at 150 °C for several hours leads to a reduction of the waveguide attenuation constant by more than 5 dB cm−1at a wavelength of 457 nm without significant change of the profile of the mode confining barrier. A minimum waveguide attenuation constant of 1.3 dB cm−1in planar and 2.2 dB cm−1in channel waveguides at 515 nm was achieved. Second‐harmonic generation measurements in the waveguides showed that the conversion efficiency can be improved by more than a factor of 2 by the annealing process. ©1995 American Institute of Physics.

 

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