Low‐temperature annealing of ion‐implanted KNbO3waveguides for second‐harmonic generation
作者:
Tomas Pliska,
Dieter H. Jundt,
Daniel Fluck,
Peter Gu¨nter,
Daniel Rytz,
Martin Fleuster,
Christoph Buchal,
期刊:
Journal of Applied Physics
(AIP Available online 1995)
卷期:
Volume 77,
issue 12
页码: 6114-6120
ISSN:0021-8979
年代: 1995
DOI:10.1063/1.359137
出版商: AIP
数据来源: AIP
摘要:
Results on annealing experiments of He+ion‐implanted KNbO3planar and channel waveguides are reported. Annealing at 150 °C for several hours leads to a reduction of the waveguide attenuation constant by more than 5 dB cm−1at a wavelength of 457 nm without significant change of the profile of the mode confining barrier. A minimum waveguide attenuation constant of 1.3 dB cm−1in planar and 2.2 dB cm−1in channel waveguides at 515 nm was achieved. Second‐harmonic generation measurements in the waveguides showed that the conversion efficiency can be improved by more than a factor of 2 by the annealing process. ©1995 American Institute of Physics.
点击下载:
PDF
(898KB)
返 回