Calculation of the structural dependence of infrared absorption inp‐type strained layer SiGe/Si quantum wells
作者:
Tsyr‐Shyang Liou,
Tahui Wang,
Chun‐Yen Chang,
期刊:
Journal of Applied Physics
(AIP Available online 1995)
卷期:
Volume 77,
issue 12
页码: 6646-6650
ISSN:0021-8979
年代: 1995
DOI:10.1063/1.359076
出版商: AIP
数据来源: AIP
摘要:
A study of infrared absorption due to intersubband transitions inp‐type Si1−xGex/Si quantum wells has been performed. The influence of the hole envelope wave‐function and the subband structure on the absorption characteristics is evaluated. In the calculation, the subbands in a SiGe strained layer are computed by using a bond orbital model, which combines thek⋅pand the tight‐binding methods, with a strain Hamiltonian. Both of the Poisson and the Schro¨dinger equations are solved self‐consistently to take into account a band‐bending effect. The calculated quantum efficiency in a 40 A˚ Si0.75Ge0.25/Si quantum well detector is compared favorably with an experimental result. The structural dependence of infrared absorption on quantum well width, doping and Ge content in a wavelength range of 3–15 &mgr;m is investigated. By varying a well width, our study reveals that a maximum absorption coefficient is obtained when the energy level of the excited‐state subband is near the top of a quantum well. ©1995 American Institute of Physics.
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