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Growth ofCaF2on Si(111): Imaging of the CaF interface by friction force microscopy

 

作者: Andreas Klust,   Holger Pietsch,   Joachim Wollschla¨ger,  

 

期刊: Applied Physics Letters  (AIP Available online 1998)
卷期: Volume 73, issue 14  

页码: 1967-1969

 

ISSN:0003-6951

 

年代: 1998

 

DOI:10.1063/1.122337

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The initial growth state ofCaF2/Si(111)has been investigated in the high-temperature regime(700 °C).At these growth temperatures the interface betweenCaF2and Si consists of CaF with the Ca atoms bound to the Si. Using friction force microscopy it is possible to distinguish between the interfacial CaF layer and the overgrowingCaF2with high lateral resolution: the CaF layer has a higher friction coefficient than the bulklikeCaF2.This material contrast has been used to investigate theCaF2nucleation on the interfacial CaF layer. ©1998 American Institute of Physics.

 

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