Synchrotron radiation micro-Fourier transform infrared spectroscopy applied to photoresist imaging
作者:
L. E. Ocola,
F. Cerrina,
Tim May,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 71,
issue 6
页码: 847-849
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.119665
出版商: AIP
数据来源: AIP
摘要:
The application of a micro-Fourier transform infrared, (&mgr;-FTIR), spectroscopic system, using synchrotron radiation as a light source, for photoresist chemical analysis has been investigated. The better signal to noise due to the high brightness of the infrared radiation from the synchrotron permits higher spatial resolution scans than with a conventional glowbar. This permits a new technique of &mgr;-FTIR spectroscopy, which potentially can get close to diffraction limited resolution, with high chemical sensitivity, for mid-IR wavelengths ranging from 2.3 &mgr;m(4400 cm−1)to 9 &mgr;m(1100 cm−1).An example of application of imaging the local chemistry changes of a chemically amplified photoresist with post-exposure bake shows the exciting capability of this technique for nondestructive resist exposure process control. ©1997 American Institute of Physics.
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