Structure of the Si(111) (3)1/2×(3)1/2–Sb interface by surface x‐ray absorption fine structure and photoemission
作者:
J. C. Woicik,
T. Kendelewicz,
K. E. Miyano,
E. Spicer,
期刊:
Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films
(AIP Available online 1991)
卷期:
Volume 9,
issue 3
页码: 1956-1961
ISSN:0734-2101
年代: 1991
DOI:10.1116/1.577435
出版商: American Vacuum Society
关键词: SILICON;EXAFS;PHOTOELECTRON SPECTROSCOPY;ANTIMONY;INTERFACE STRUCTURE;CORE LEVELS;MONOLAYERS;BOND LENGTHS;METAL−SEMICONDUCTOR CONTACTS;Si;Sb
数据来源: AIP
摘要:
The combined techniques of surface extended x‐ray absorption fine structure (SEXAFS) and high resolution core level photoelectron spectroscopy have been used to investigate the local bonding structure of the Sb/Si(111) interface. We find that the adsorption of 1 monolayer (ML) of Sb completely eliminates the surface components of the Si 2pcore level spectrum. The Sb induced Si 2pinterfacial core level has been found to be shifted 0.20±0.02 eV toward higher binding energy with an intensity that corresponds to the top 1 ML of surface atoms. The SEXAFS determination of the absolute surface coordination numbers and bond lengths within the first Sb shell is 2.1±0.3 Sb atoms at 2.86±0.02 Å and 2.0±0.4 Si atoms at 2.66±0.03 Å. Together, these results indicate that Sb trimers occupy the three fold atop sites of the Si(111) surface where each Sb atom is bonded to two Si atoms in a modified bridge configuration.
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