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Direct atomic flux measurement of electron-beam evaporated yttrium with a diode-laser-based atomic absorption monitor at 668 nm

 

作者: Weizhi Wang,   R. H. Hammond,   M. M. Fejer,   S. Arnason,   M. R. Beasley,   M. L. Bortz,   T. Day,  

 

期刊: Applied Physics Letters  （AIP Available online 1997）
卷期: Volume 71, issue 1  

页码: 31-33

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.119460

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A direct measurement of atomic flux ine-beam evaporated yttrium has been demonstrated with a diode-laser-based atomic absorption (AA) monitor at 668 nm. Atomic number density and velocity were measured through absorption and Doppler shift measurements to provide the atomic flux. The AA-based deposition rates were compared with independent quartz crystal monitors showing agreement between the two methods. ©1997 American Institute of Physics.

 

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