Controlling H atom production in the 193 nm laser photolysis of triethylarsenic
作者:
Xiaodong Xu,
Subhash Deshmukh,
Jeffrey L. Brum,
Brent Koplitz,
期刊:
Applied Physics Letters
(AIP Available online 1991)
卷期:
Volume 58,
issue 20
页码: 2309-2311
ISSN:0003-6951
年代: 1991
DOI:10.1063/1.104908
出版商: AIP
数据来源: AIP
摘要:
We report on the production of atomic hydrogen subsequent to the 193 nm photolysis of triethylarsenic (TEAs) using an excimer laser. The H atoms are probed via two‐photon (121.6+364.7 nm) ionization, and the resulting H atom Doppler profile at Lyman‐&agr; is presented. Photolysis power dependence studies demonstrate that substantial H atom formation occurs at relatively low laser powers. However, the H atom signal actually begins to diminish as the photolysis laser power is increased beyond ∼70 MW/cm2. Correlations with time‐of‐fight mass spectral data suggest that ion channels are being accessed. The possible mechanisms for TEAs excitation that lead to H atom formation/depletion are presented, and the implications of these observations on controlling carbon incorporation in the laser‐enhanced growth of films of GaAs, AlGaAs, etc. are discussed.
点击下载:
PDF
(430KB)
返 回