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Controlling H atom production in the 193 nm laser photolysis of triethylarsenic

 

作者: Xiaodong Xu,   Subhash Deshmukh,   Jeffrey L. Brum,   Brent Koplitz,  

 

期刊: Applied Physics Letters  (AIP Available online 1991)
卷期: Volume 58, issue 20  

页码: 2309-2311

 

ISSN:0003-6951

 

年代: 1991

 

DOI:10.1063/1.104908

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We report on the production of atomic hydrogen subsequent to the 193 nm photolysis of triethylarsenic (TEAs) using an excimer laser. The H atoms are probed via two‐photon (121.6+364.7 nm) ionization, and the resulting H atom Doppler profile at Lyman‐&agr; is presented. Photolysis power dependence studies demonstrate that substantial H atom formation occurs at relatively low laser powers. However, the H atom signal actually begins to diminish as the photolysis laser power is increased beyond ∼70 MW/cm2. Correlations with time‐of‐fight mass spectral data suggest that ion channels are being accessed. The possible mechanisms for TEAs excitation that lead to H atom formation/depletion are presented, and the implications of these observations on controlling carbon incorporation in the laser‐enhanced growth of films of GaAs, AlGaAs, etc. are discussed.

 

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