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Thermal instability of anodic sulfide films on Hg1−xCdxTe

 

作者: Zongfu Ma,   Rui Li,  

 

期刊: Applied Physics Letters  (AIP Available online 1990)
卷期: Volume 56, issue 24  

页码: 2417-2418

 

ISSN:0003-6951

 

年代: 1990

 

DOI:10.1063/1.103189

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Thermal instability of anodic sulfide films on Hg1−xCdxTe was studied. Instead of using laser ionization or ion backscattering in studying oxidic films after heat treatment, we used x‐ray photoelectron spectroscopy (XPS) in analyzing nonaqueous sulfidization. In this case, XPS is feasible, simpler, and has the advantage of better resolution. Hg evaporation was investigated here by measuring Te(3d5/2) of Te oxide peak rather than Hg lines. Correlation between thermal instability and compositionxwas obtained.

 

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