Hot‐electron induced interface traps in metal/SiO2/Si capacitors: The effect of gate‐induced strain
作者:
Terence B. Hook,
T. P. Ma,
期刊:
Applied Physics Letters
(AIP Available online 1986)
卷期:
Volume 48,
issue 18
页码: 1208-1210
ISSN:0003-6951
年代: 1986
DOI:10.1063/1.96983
出版商: AIP
数据来源: AIP
摘要:
It is shown that the generation of interface traps by Fowler–Nordheim injection, like those generated by ionizing radiation, is a function of the mechanical strain at the silicon‐silicon dioxide interface. However, because of the current enhancement at the edge of a metal‐oxide‐semiconductor gate when the gate serves as the hot‐electron injector, this phenomenon may only be evident when the device is stressed with the gate biased positively. It is also shown that the capture rate of electrons in the silicon dioxide depends on the strain in the film.
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