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Secondary ion mass spectroscopy determination of oxygen diffusion coefficient in heavily Sb doped Si

 

作者: M. Pagani,  

 

期刊: Journal of Applied Physics  (AIP Available online 1990)
卷期: Volume 68, issue 7  

页码: 3726-3728

 

ISSN:0021-8979

 

年代: 1990

 

DOI:10.1063/1.346311

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The diffusion coefficient of oxygen in heavily antimony doped Czochralski Si was measured in the temperature range 950–1100 °C by using secondary ion mass spectroscopy (SIMS). The diffusion coefficient, obtained from SIMS oxygen concentration profiles in samples submitted to out diffusion, shows no dependence on antimony concentration. The combined data give an activation energy of 2.68 eV, which is in good agreement with published results.

 

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