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Field effect studies inp‐type InSb MIS structures

 

作者: P. C. Mathur,   O. P. Taneja,   K. V. Krishna,   A. D. Sen,   A. L. Dawar,  

 

期刊: Journal of Applied Physics  (AIP Available online 1980)
卷期: Volume 51, issue 4  

页码: 2258-2260

 

ISSN:0021-8979

 

年代: 1980

 

DOI:10.1063/1.327852

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Field effect studies on MIS structures of silver‐glassp‐type InSb have been made in the temperature range 77–300 K. It has been observed that the effect of negative gate voltage is to decrease the Hall coefficient, Hall mobility, and grain boundary barrier potential, while the effect of positive gate voltage is opposite but less significant. The results can be explained in terms of accumulation and depletion layers, induced on the surface.

 

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