Stability and interdiffusion of short‐period Si/Ge strained layer superlattices
作者:
E. Friess,
R. Schorer,
K. Eberl,
G. Abstreiter,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1991)
卷期:
Volume 9,
issue 4
页码: 2045-2047
ISSN:1071-1023
年代: 1991
DOI:10.1116/1.585774
出版商: American Vacuum Society
关键词: SILICON;GERMANIUM;SUPERLATTICES;STRAINS;DIFFUSION;RAMAN SPECTRA;ANNEALING;MATHEMATICAL MODELS;BACKSCATTERING;MEDIUM TEMPERATURE;MOLECULAR BEAM EPITAXY;ELECTRON DIFFRACTION;AUGER ELECTRON SPECTROSCOPY;Si;Ge
数据来源: AIP
摘要:
Interdiffusion of Si/Ge short‐period superlattices is studied in detail with Raman spectroscopy. Folded acoustic modes and alloy modes from the interface region are found to be very sensitive to intermixing and concentration profile. Annealing at elevated temperature first leads to indiffusion of Si into the Ge layers. The diffusion constant depends strongly on the Si content and consequently varies during the interdiffusion process. The experimental results are qualitatively understood on the basis of a simple atomistic diffusion model. In high quality samples with sharp interfaces the onset of intermixing is observed already at temperatures as low as 450 °C.
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