Anisotropic thermionic emission of electrons contained in GaAs/AlAs floating gate device structures
作者:
J. A. Lott,
J. F. Klem,
H. T. Weaver,
期刊:
Applied Physics Letters
(AIP Available online 1989)
卷期:
Volume 55,
issue 12
页码: 1226-1228
ISSN:0003-6951
年代: 1989
DOI:10.1063/1.101662
出版商: AIP
数据来源: AIP
摘要:
Thermionic emission rates are reported for electrons in GaAs epilayers, where electrostatic barriers within the layers and GaAs/AlAs heterojunctions form different sides of the potential well. Attempt times at the two barrier types were observed to differ by factors above 107due to differing constraints on momentum conservation during emission. These emissions represent escape mechanisms for charge stored in a closed geometry, III‐V compound floating gate transistor, with potential application as dynamic random access or nonvolatile memories.
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