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Photosensitive Protecting Groups — A Review

 

作者: B. Amit,   U. Zehavi,   A. Patchornik,  

 

期刊: Israel Journal of Chemistry  （WILEY Available online 1974）
卷期: Volume 12, issue 1‐2  

页码: 103-113

 

ISSN:0021-2148

 

年代: 1974

 

DOI:10.1002/ijch.197400011

 

出版商: WILEY‐VCH Verlag

 

数据来源: WILEY

 

摘要:

AbstractA review of recent work utilizing photosensitive protecting groups is presented, (literature to September 1973 is reviewed). Although still in the developmental stage, the application of groups such as 2‐nitrobenzyl, 3‐nitrophenyl, 3,5‐dimethoxybenzyl, 2,4‐dinitrobenzenesulfenyl and 3,5‐dimethoxybenzoinyl in synthetic chemistry shows great promise for t

 

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