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Metastable assisted deposition of TiN films

 

作者: H. Bara´nkova´,   L. Ba´rdosˇ,   S. Berg,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 67, issue 11  

页码: 1521-1523

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.114479

 

出版商: AIP

 

数据来源: AIP

 

摘要:

An excess heat from an exothermic reaction of metastable Ar (43P0) and Ar (43P2) atoms with N2molecules at low contents of N2in Ar was found to be responsible for an enhanced thermionic emission, an enhanced production of Ti target vapor, an increased ionization, and consequently for an enhanced deposition rate of TiN films in the radio frequency hollow cathode plasma jet (RHCPJ). This finding emphasizes favorable geometry of hollow cathodes, as well as an important role of metastables in plasma‐assisted processes. ©1995 American Institute of Physics.

 

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