Two‐dimensional fluid model of high density inductively coupled plasma sources
作者:
R. A. Stewart,
P. Vitello,
D. B. Graves,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1994)
卷期:
Volume 12,
issue 1
页码: 478-485
ISSN:1071-1023
年代: 1994
DOI:10.1116/1.587102
出版商: American Vacuum Society
关键词: PLASMA;TWO−DIMENSIONAL CALCULATIONS;ELECTRON TEMPERATURE;PLASMA POTENTIAL;PLASMA DENSITY;CHARGED−PARTICLE TRANSPORT;MEDIUM VACUUM;ARGON
数据来源: AIP
摘要:
A two‐dimensional (r,z) fluid model has been developed to study plasma transport in inductively coupled plasmas (ICP). Electron heating is treated by assuming a fixed, spatially varying power deposition profile in the electron energy balance equation. A high aspect ratio ICP reactor geometry has been studied, with two assumed power profiles: spatially uniform and localized to within several skin depths of the radial wall. The effect of neutral gas pressure on plasma uniformity is presented for an argon discharge over the range of 1–20 mTorr. Comparisons between the fluid model and predictions from a spatially averaged global model show similar scaling of plasma density, electron temperature, and plasma potential over a wide range of pressure and power.
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