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Boron diffusivity in nonimplanted diamond single crystals measured by impedance spectroscopy

 

作者: Dario Narducci,   Jerome J. Cuomo,  

 

期刊: Journal of Applied Physics  (AIP Available online 1990)
卷期: Volume 68, issue 3  

页码: 1184-1186

 

ISSN:0021-8979

 

年代: 1990

 

DOI:10.1063/1.346714

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Boron diffusivity in single‐crystal diamond has been investigated. To this aim, a novel method using impedance spectroscopy for the study of the atomic diffusivity in wide‐gap semiconductor has been developed, along with a model for the analysis of the dielectric response function. The advantages of this procedure are discussed. Boron diffusivity in diamond has been determined to be 6.9×10−20cm2 s−1at 800 °C. A discussion of the results and a comparison with previous estimates are presented.

 

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