Boron diffusivity in nonimplanted diamond single crystals measured by impedance spectroscopy
作者:
Dario Narducci,
Jerome J. Cuomo,
期刊:
Journal of Applied Physics
(AIP Available online 1990)
卷期:
Volume 68,
issue 3
页码: 1184-1186
ISSN:0021-8979
年代: 1990
DOI:10.1063/1.346714
出版商: AIP
数据来源: AIP
摘要:
Boron diffusivity in single‐crystal diamond has been investigated. To this aim, a novel method using impedance spectroscopy for the study of the atomic diffusivity in wide‐gap semiconductor has been developed, along with a model for the analysis of the dielectric response function. The advantages of this procedure are discussed. Boron diffusivity in diamond has been determined to be 6.9×10−20cm2 s−1at 800 °C. A discussion of the results and a comparison with previous estimates are presented.
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