Recent studies concerning uranium plasma chemistry have confirmed the generally complicated nature of uranium chemistry1. Uranium plasma, generated by either rf-heating or dc arc torch argon heating of uranium hexafluoride, tends to react with its environment to produce among other compounds both fluorides and oxy-fluorides. The products are characterized as amorphous, powdery deposits. While uranyl fluoride can be identified readily by its infra-red absorption band, uranium tetrafluoride is not easily analyzed by any routine, non-destructive technique. Procedures such as Ion Scattering Spectroscopy and Secondary Ion Mass Spectrometry are expensive and time consuming; while, X- ray and electron deffraction can not overcome the amorphous nature of the plasma deposits.