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Oxidation Behavior of Silicon Yttrium Oxynitride

 

作者: Jean‐Bernard Veyret,   Marcel Voorde,   Michel Billy,  

 

期刊: Journal of the American Ceramic Society  （WILEY Available online 1992）
卷期: Volume 75, issue 12  

页码: 3289-3292

 

ISSN:0002-7820

 

年代: 1992

 

DOI:10.1111/j.1151-2916.1992.tb04423.x

 

出版商: Blackwell Publishing Ltd

 

数据来源: WILEY

 

摘要:

The oxidation behavior of the silicon yttrium oxynitride Y10Si7O23N4, so‐called H‐phase, in the temperature range 700–1400°C has been investigated. A nitrogen retention phenomenon in the oxidation product Y4.67(SiO4)3O (O‐apatite) is discussed. The H‐phase is one of the four quaternary compounds identified in hot‐pressed Si3N4materials fabricated within the Si3N4–SiO2–Y2O3pseu

 

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