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Energy loss and escape depth of hot electrons from shallowp‐njunctions in silicon

 

作者: I. Shahriary,   J. R. Schwank,   F. G. Allen,  

 

期刊: Journal of Applied Physics  (AIP Available online 1979)
卷期: Volume 50, issue 3  

页码: 1428-1438

 

ISSN:0021-8979

 

年代: 1979

 

DOI:10.1063/1.326126

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The emission of electrons from a reverse‐biassedp‐nlocated below and parallel to ann‐type emitting surface has been investigated experimentally. By sputter thinning thenlayer, followed by annealing and CS‐O treatments all in vacuum, we have been able to measure the energy distributions of emitted electrons at several differentn‐layer thicknesses, allowing direct application of a theoretical treatment due to Baraff. The surface barrier of ∼1.1 eV enables us to sample electrons having an average energy of about 3.0 eV above the conduction‐band minimum. At these energies, considerably below those studied by most others, we find the mean free path for optical phonon emission,Lp, to be 141 A˚, for ionization,Li, to be 8526 A˚, and the total attenuation length,Lo, to be 359 A˚.

 

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