Plasma potentials of 13.56‐MHz rf argon glow discharges in a planar system
作者:
K. Ko¨hler,
J. W. Coburn,
D. E. Horne,
E. Kay,
J. H. Keller,
期刊:
Journal of Applied Physics
(AIP Available online 1985)
卷期:
Volume 57,
issue 1
页码: 59-66
ISSN:0021-8979
年代: 1985
DOI:10.1063/1.335396
出版商: AIP
数据来源: AIP
摘要:
The plasma potential of 13.56‐MHz low‐pressure argon glow discharges has been measured for various modes of applying the rf power in a geometrically asymmetric planar system. The plasma potential is determined from the energy distribution of positive ions incident on the grounded electrode. The voltages on the excitation electrode (target electrode) are carefully measured and the capacitive sheath approximation is used to relate these measured voltages to the measured plasma potential. This approximation is successful in most of the situations encountered in this low‐pressure (20 mTorr) relatively low‐power density regime. The effects of superimposing dc voltages on the excitation electrode are discussed.
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