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Annihilation of monolayer holes on molecular beam epitaxy grown GaAs surface during annealing as shown byinsituscanning electron microscopy

 

作者: Naohisa Inoue,   Keizo Morimoto,   Tsutomi Araki,   Taichiro Ito,   Yoshikazu Homma,   Jiro Osaka,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  (AIP Available online 1996)
卷期: Volume 14, issue 6  

页码: 3575-3581

 

ISSN:1071-1023

 

年代: 1996

 

DOI:10.1116/1.588545

 

出版商: American Vacuum Society

 

关键词: GaAs

 

数据来源: AIP

 

摘要:

The behavior of monolayer‐deep holes on the surface of (001) GaAs grown by molecular beam epitaxy during post‐growth annealing is observed byinsituscanning electron microscopy. Most small holes disappear immediately after growth in the same way as the islands. However, it is found that some are left for a long time and form big holes with each other. These residual big holes are elongated in the [110] direction initially. They extend in the [110]direction and coalesce with each other, but, at the same time, they shrink in the [1–10] direction and become elongated in the [110]direction. Finally they shrink in both directions and disappear. It takes about 10 min for all the holes to disappear, which is much longer than the growth interruption period usually employed to smooth heterointerfaces. The anisotropic behavior of big holes are discussed in relation to the reported growth anisotropy.

 

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