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Charge Multiplication in GaPp‐nJunctions

 

作者: R. A. Logan,   A. G. Chynoweth,  

 

期刊: Journal of Applied Physics  (AIP Available online 1962)
卷期: Volume 33, issue 5  

页码: 1649-1654

 

ISSN:0021-8979

 

年代: 1962

 

DOI:10.1063/1.1728804

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Charge multiplication arising from carriers injected intop‐njunctions in gallium phosphide has been studied as a function of applied bias. From these and capacitance studies, the carrier ionization rate as a function of field has been determined. It is found to be very similar, both qualitatively and quantitatively, to the behavior in silicon. In particular, the mean free path for hot carriers between collisions involving optical phonon emission is of the order of 100 A. An additional result obtained from simple analysis of the photoresponse and capacitance behavior of the junctions is that the dominant carrier lifetime is 10−10sec.

 

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