Enhanced Negative Ion Formation in ArF‐Laser‐Irradiated Methane: Possible Implications for Plasma Processing Discharges
作者:
L. A. Pinnaduwage,
M. Z. Martin,
L. G. Christophorou,
期刊:
Contributions to Plasma Physics
(WILEY Available online 1995)
卷期:
Volume 35,
issue 4‐5
页码: 433-438
ISSN:0863-1042
年代: 1995
DOI:10.1002/ctpp.2150350411
出版商: WILEY‐VCH Verlag
数据来源: WILEY
摘要:
AbstractOberservation of enhanced electron attachment to ArF‐excimer‐laser irradiated methane is reported. Preliminary evidence is presented that laser‐excited superexcited states of CH4(or other excited states to which these convert) are responsible for the observed enhanced electron attachment, and, that predominantly H−ions are produced via this process. The possible significance of this process for plasma processing discharges using CH4and its mixtures is in
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