Gallium desorption from GaAs and (Al,Ga)As during molecular beam epitaxy growth at high temperatures
作者:
E. M. Gibson,
C. T. Foxon,
J. Zhang,
B. A. Joyce,
期刊:
Applied Physics Letters
(AIP Available online 1990)
卷期:
Volume 57,
issue 12
页码: 1203-1205
ISSN:0003-6951
年代: 1990
DOI:10.1063/1.103485
出版商: AIP
数据来源: AIP
摘要:
Direct measurements of the desorption rate of gallium from GaAs and (Al,Ga)As during growth by molecular beam epitaxy at high temperatures have been made by modulated beam mass spectrometry. The activation energy for desorption is dependent upon the nature of the site from which the gallium is lost. From free gallium atoms not incorporated into the lattice, behavior similar to that encountered under equilibrium conditions for gallium over gallium or gallium over GaAs is observed. For gallium lost from the GaAs lattice the apparent activation energy is higher and is influenced by the arsenic flux reaching the surface.
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