Implantation of shallow impurities in Cr‐doped semi‐insulating GaAs
作者:
P. N. Favennec,
H. L’Haridon,
期刊:
Applied Physics Letters
(AIP Available online 1979)
卷期:
Volume 35,
issue 9
页码: 699-701
ISSN:0003-6951
年代: 1979
DOI:10.1063/1.91259
出版商: AIP
数据来源: AIP
摘要:
Zinc and selenium implantations have been performed in Cr‐doped semi‐insulating GaAs. We show that all zinc and selenium implanted impurities are electrically active after annealing at 900 °C. But, in addition to the implantation distribution, there is a distribution induced by the chromium outdiffusion during annealing leading to a Cr‐depleted zone, which can become conductive. By taking into account these distributions, the electrical measurements may be explained.
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