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Implantation of shallow impurities in Cr‐doped semi‐insulating GaAs

 

作者: P. N. Favennec,   H. L’Haridon,  

 

期刊: Applied Physics Letters  (AIP Available online 1979)
卷期: Volume 35, issue 9  

页码: 699-701

 

ISSN:0003-6951

 

年代: 1979

 

DOI:10.1063/1.91259

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Zinc and selenium implantations have been performed in Cr‐doped semi‐insulating GaAs. We show that all zinc and selenium implanted impurities are electrically active after annealing at 900 °C. But, in addition to the implantation distribution, there is a distribution induced by the chromium outdiffusion during annealing leading to a Cr‐depleted zone, which can become conductive. By taking into account these distributions, the electrical measurements may be explained.

 

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