Vinylidenefluoride and tetrafluoroethylene copolymer powder was evaporated to grow a thin film of polyvinylidenefluoride on a Si wafer with the native oxide layer held at 80 °C in a vacuum of10−5Torr. Its initial growth process was studied with an atomic force microscope. Some features in the initial film growth stage at 0.2 to 6 nm in its thicknessdare: (1) “plateau” and “mountain” islands with the number density in the order of107cm−2grow with the coverage linearly increasing withd; (2) secondary plateau islands grow atd>2nm; (3) the height was 6, 25, and 1.5 nm for plateau, mountain, and secondary plateau islands, respectively, which was almost independent ofd. These are briefly discussed from the viewpoint of the crystallization of bulk polymer and from the thin film growth process.